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Influence of Periodic Surface Nanopatterning Profiles on Series Resistance in Thin-Film Crystalline Silicon Heterojunction Solar Cells

机译:周期表面纳米图形对系列的影响   薄膜晶体硅异质结太阳能电池的电阻

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摘要

In the frame of the development of thin crystalline silicon solar celltechnologies, surface nanopatterning of silicon is gaining importance. Itsimpact on the material quality is, however, not yet fully controlled.Weinvestigate here the influence of surface nanotexturing on the seriesresistance of a contacting scheme relevant for thin-film crystalline siliconheterojunction solar cells. Two dimensional periodic nanotextures arefabricated using a combination of nanoimprint lithography and either dry or wetetching, while random pyramid texturing is used for benchmarking. We comparethese texturing techniques in terms of their effect on the series resistance ofa solar cell through a study of the sheet resistance (Rsh ) and contactresistance (Rc) of its front layers, i.e., a sputtered transparent conductiveoxide and evaporated metal contacts. We have found by four-point probe and thetransfer length methods that dry-etched nanopatterns render the highest Rsh andRc values. Wet-etched nanopatterns, on the other hand, have less impact on Rcand render Rsh similar to that obtained from the nontextured case.
机译:在薄晶体硅太阳能电池技术发展的框架中,硅的表面纳米图案化变得越来越重要。然而,它对材料质量的影响尚未得到完全控制。我们在这里研究表面纳米纹理对与薄膜晶体硅异质结太阳能电池相关的接触方案的串联电阻的影响。二维周期性纳米纹理是使用纳米压印光刻技术和干法或湿法蚀刻的组合制造的,而随机金字塔纹理用于基准测试。我们通过研究其表面层的薄层电阻(Rsh)和接触电阻(Rc)(即溅射的透明导电氧化物和蒸发的金属触点)来比较这些纹理化技术对太阳能电池的串联电阻的影响。通过四点探针和转移长度方法,我们发现干法刻蚀的纳米图案具有最高的Rsh和Rc值。另一方面,湿法蚀刻的纳米图案对Rcand的影响较小,从而使Rsh类似于从无纹理情况下获得的结果。

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